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A User's Guide to Vacuum Technology O'Hanlon, John F. Hardcover - 2003 - 3rd Edition
by John F. O'Hanlon
- Used
- Hardcover
Description
Standard delivery: 14 to 30 days
Details
- Title A User's Guide to Vacuum Technology O'Hanlon, John F.
- Binding Hardcover
- Edition number 3rd
- Edition 3
- Pages 536
- Volumes 1
- Language ENG
- Publisher Wiley-Interscience, USA
- Date July 4, 2003
- Features Bibliography, Index
- Bookseller's Inventory # AZ-UPLOAD14-A126353
- ISBN 9780471270522 / 0471270520
- Weight 1.91 lbs (0.87 kg)
- Dimensions 9.5 x 6.34 x 1.25 in (24.13 x 16.10 x 3.18 cm)
- Library of Congress subjects Vacuum technology
- Library of Congress Catalog Number 2003045051
- Dewey Decimal Code 621.55
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First line
From the rear cover
The leading text in the field--fully updated to reflect changes in vacuum technology
In the decade and a half since the publication of the Second Edition of A User's Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today's vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User's Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
The Third Edition features significant additions, including:
- Updated coverage of all topics
- A discussion of SI units and their conversion
- Expanded coverage of gauges, pumps, materials, components, and systems
- A discussion of ultraclean vacuum systems-now used routinely in high-volume production of semiconductor chips and related process-sensitive devices
- A review of rough pumping and crossover, including methods for prevention of aerosol formation
As with previous editions, the Third Edition is an important resource for both students and professionals in microelectronics, optics, thin-film coating, and other industries dependent on leading-edge applications of vacuum technology.