Description:
Bellingham, WA, U.S.A.: SPIE PRESS-The International Society for Optical Engineering, 1984. Ex-Library. Very Good. Paperback. 1st.. W/full markings and pocket. Wear, Soil. Size: 4to.
Stock Photo: Cover May Be Different
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering) Paperback - 1984
by Alfred (Editor) Wagner
Details
- Title Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering)
- Author Alfred (Editor) Wagner
- Binding Paperback
- Edition 1st
- Publisher SPIE--the International Society for Optical Engineering, Bellingham, WA, U.S.A.
- Date 1984
- ISBN 9780892525065
More Copies for Sale
Stock Photo: Cover May Be Different
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, Conference Proceedings, Volume 471, 15-16 March 1984, Santa Clara, California, SPIE.
by Wagner, Alfred (Editor)
- Used
- Very Good
- Paperback
- first
- Condition
- Used - Very Good
- Edition
- 1st.
- Binding
- Paperback
- ISBN 10 / ISBN 13
- 9780892525065 / 0892525061
- Quantity Available
- 1
- Seller
-
NEWARK, Ohio, United States
- Item Price
-
NZ$29.84NZ$9.12 shipping to USA
Show Details
Item Price
NZ$29.84
NZ$9.12
shipping to USA